VLSI Research Inc.

Intel's Sunit Rikhi talks about how Design For Manufacturing (DFM) solutions have enabled their 65nm production ramp. It, in conjunction with their mask technology, has allowed them to be the first to push conventional dry 193nm lithography deep down to 45nm. Intel has a chocolaty-rich DFM approach. Sunit shows what it's all about, how it works, and why DFM is making fast yield ramps possible in the nanochip era. Learn about synchronization between product and process development at Intel and their Define - Develop - Validate - Ramp process. It's how Intel defines the pace of Moore's Law and brings products to market. Sunit Rikhi is Director of Advanced Design in Logic Technology Development at Intel and chairs their logic technology planning and synchronization process.

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