In this video, Gene Fuller
covers the latest progress in lithography at Nikon in both immersion and
EUV. In addition to the above topics, he also discusses the progress
that's been made with immersion at Nikon, with results that show defects
should no longer be an issue with immersion if you've got the right
tool. He also discusses how immersion is different than dry in
manufacturing and how you will need to approach it differently to
optimize the results in your fab . . .