VLSI Research Inc.

In this video, Gene Fuller covers the latest progress in lithography at Nikon in both immersion and EUV. In addition to the above topics, he also discusses the progress that's been made with immersion at Nikon, with results that show defects should no longer be an issue with immersion if you've got the right tool. He also discusses how immersion is different than dry in manufacturing and how you will need to approach it differently to optimize the results in your fab . . .


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